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Adcon Papers

1st made-in-China production proven CMP slurry paper – 2004 SEMICON China

8th Annual International CMP Conference_NanoCeria_DuPont & Adcon Lab Inc Paper

ADVANCED FRONT END CMP AND INTEGRATION SOLUTIONS

A Production-Proven Shallow Trench Isolation (STI) Solution Using Novel CMP Concepts

New Generation CMP Equipment and its Impact on IC Devices

A Novel Retaining Ring in Advanced Polishing Head Design for Significantly Improved CMP Performance

Technological Breakthrough in Pad Life Improvement and its Impact on CMP CoC

Proven Practice and Future Application of Polysilicon CMP in IC Fabrication

Significant Improvement of Disk-Pad Life and Polishing Performance by Using a New Pad Conditioning Disk

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